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Secon Semiconductor Equipment GmbH was founded 1998 by people with more than
20 years experience in plasma etching and an installed base of more than 100
units. Secon developed a new concept based on
advanced microwave technology with focus on dry high rate plasma etching for
production and dry etch separation of thin wafers.
Secon has long experience in
manufacturing of plasma equipment for diode manufacturers and wafer fabrication
lines in the semiconductor industry. All equipment is based on two technically
leading developments, the patented
XRG - 800 radical generator (a high efficiency
source of plasma with very high density) and the high rate etch source XRG -
900, which can remove large quantities of materials at high speed.
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President: |
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Sales & Marketing Manager: |
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Application Manager: |
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Address: |
Laxenburgerstr. 17, A-2353
Guntramsdorf, Österreich, Austria |
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Telephone: |
+43 2236 540 500 |
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Fax: |
+43 2236 540 5012 |
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E-mail: |
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Website: |