Secon has been a manufacturer of plasma equipment for diode manufacturers and wafer fabrication lines in the semiconductor industry for 20 years. All equipment is based on two technically leading developments, the patented XRG - 800 radical generator (a high efficient source for plasma with a very high density) and the high rate etch source XRG - 900, which can remove large quantities of materials at high speed.

Secon provides the following technology in,

• Plasma Etching Process: Anisotropic etching with extremely low ion damages in the RIE/CDE mode, a combination of RIE (Reactive Ion Etching) and CDE (Chemical Dry Etch), etching with radicals.
• Low Temperature Si₃N₄ Deposition
• XRG - 800 Radical Generator
• XRG - 900 High Rate Radical Generator for wafer thinning application
• Ultra-thin wafer handling

Copyright © 2002 Secon Semiconductor Equipment (M) Sdn. Bhd.
Last modified: Juli 03, 2002