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The radical generators consists of 2.45 GHz magnetron, a rectangular resonator cavity with permanently adjusted pins, a plasma discharge tube made of quartz or alumina, of chokes against microwave radiation, and a gas inlet with built-in sensors. Optionally, a magnetic system is available for extensions of the pressure range.
The magnetron produces microwaves with a wavelength of 12.3 cm, which are coupled into a tube so that a standing transversal electrical wave with defined voltage and maximum power is generated. The dimensions of the tube are such that the wave is reflected on the flat phase shift. The diameter of the plasma discharge tube corresponds to a quarter wavelength. The geometry of alumina tube and rotameter cavity is such, that the forward wave has its voltage maximum at the reactor tube wall facing the magnetron, while the phase shifted reflected wave has its voltage maximum at the opposite reactor tube wall. As a result in a double voltage between the maximum voltage on the walls, in the tube center, the maximum current and in total, fourfold energy. The process gases led through the reactor tube are excited to high density plasma (> 60W/cm3) in the volume which is within the tube. The electrically charged particles of the plasma are caught in the electric field, so that only radicals and no ions or electrons can leave the radical generator. The Secon XRG-800 microwave radical generator is permanently set, which eliminated the necessity of readjustment, even after an exchange of either the magnetron or the reactor tube. The patented Secon XRG-800 produces a high efficient source of radicals with a long lifetime (0.7s at O, N, F) for use in dry etch and deposition processes. Key Benefits
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Copyright © 2002 Secon Semiconductor Equipment (M) Sdn. Bhd.
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